ASML is the sole producer of cutting-edge EUV lithography machines for advanced 3nm chip manufacturing. How secure is that ...

First, because EUV light is absorbed by air (in contrast with 193 nm light), the entire optical system, from source to wafer, must be enclosed in a near-vacuum environment. Second, because EUV ...

Second, owing to matter's propensity to absorb EUV light, the entire optical path from the light source to the wafer must be in a near-vacuum (Fig. 2). To maintain this throughout the lifetime of ...

LDP is a lower-cost light source than the laser-produced plasma (LPP) used by ASML. The LPP is more difficult to manage but produces a higher output plasma. China is working on all of the previously ...