To improve data storage, researchers are perfecting 3D NAND flash memory, which stacks cells to maximize space. Researchers ...

The negatively charged and extremely reactive fluorine ions are attracted to the wafer, where they attack and etch away the surfaces that aren’t protected by a photoresist layer. It all sounds ...

For [emach1ne], the DIY LED was part of a Master’s degree course and began with a slice of epitaxial wafer that goes through cleaning, annealing, and acid etching steps in preparation for ...

Micro-electronic circuit wafers are typically manufactured using plasma etch reactors. Manufacturing is accomplished by depositing layers of conducting or insulating material onto a silicon wafer and ...

The narrow, deep holes required for one type of flash memory are made twice as fast with the right recipe, which includes a plasma made from hydrogen fluoride.

However, the process, known as reactive ion etching, isn't fully understood and could be improved. One recent development ...

The etching and characterization room contains a suite of tools for dry etching and characterization of samples. This includes three dry etchers with a range of capabilities, while characterization ...

During the fabrication process, we need to etch out the unwanted oxide layer from the wafer, which can be done using plasma etching. Plasma contains high energetic ions and radicals for etching that ...